Watch the webinar Spatial Atomic Layer Deposition for Large-Area Electronics

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Please join us on Tuesday, June 16th

9am Eindhoven – 3pm Shanghai – 4pm Seoul – 4pm Tokyo

5pm Eindhoven – 11am New York – 8am San Francisco

About this webinar

This third webinar focuses on the application of Spatial ALD in large-area electronics. We will show how Spatial ALD can be used to deposit dielectric materials and high mobility oxide semiconductors for thin-film transistors. Furthermore, we will show how Spatial ALD can be used for thin-film encapsulation to protect sensitive electronic devices against the ambient. Finally, we will present high selectivity, low defectivity and high throughput area selective Spatial ALD, which will be an important method for next generation device manufacturing. Join the webinar, discover the potential of Spatial ALD for large area electronics and find out what Spatial ALD can do for your applications.

Meet the speaker

Alfredo Mameli

Alfredo Mameli received his MSc in Materials Science (cum laude) at University of Bari, Italy in 2013. He accomplished his PhD research in 2018 at TU

Eindhoven, The Netherlands, on selective atomic layer deposition and etching of oxides, in which he established novel methods for achieving area-selective atomic layer deposition and atomic layer etching. In 2018 he was awarded with the atomic layer etching (ALE) Best Student Paper Award at the ALD/ALE 2018 conference. In 2018 he joined the Thin Film Technology group at Holst Centre, powered by TNO, Eindhoven, where he led several business-to-business projects with customers and developed novel spatial ALD processes, including area-selective spatial ALD of laboratory. His current projects and interests are on surface chemistry, deposition and etching for micro- and nanofabrication, thin-film transistors and the development of selective spatial ALD processes.

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Paul Poodt

Dr. Paul Poodt started working at TNO in 2007 after receiving his Ph.D. in physics at the Radboud University Nijmegen, the Netherlands. In 2009, he joined the newly formed Spatial Atomic Layer Deposition team at TNO as lead process scientist and was involved in several spatial ALD process- and equipment development projects, including Spatial ALD for c-Si solar cell passivation and roll-to-roll ALD for encapsulation and barriers. He is one of the co-initiators of TNO’s spin-off company SoLayTec. Since 2013 he is leading the Spatial ALD research program at Holst Centre, developing Spatial ALD technology for large-area and flexible electronics in close collaboration with industry and academia. Paul is also CTO of TNO’s spin-off company SALDtech and part-time associate professor at the Eindhoven University of Technology.

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Overview:

Titel:
Spatial Atomic Layer Deposition for Large-Area Electronics

Date:
Tuesday, June 16th

Time:
9am Eindhoven – 3pm Shanghai – 4pm Seoul – 4pm Tokyo
5pm Eindhoven – 11am New York – 8am San Francisco

Duration:
40 minutes and live Q&A

In this webinar you’ll learn about:

  • The application of Spatial ALD in large-area electronics
  • Potential of Spatial ALD for large area electronics
  • What Spatial ALD can do for your applications