9am Eindhoven – 3pm Shanghai – 4pm Seoul – 4pm Tokyo

5pm Eindhoven – 11am New York – 8am San Francisco

During this webinar, the first in a series of four, we introduce you to Spatial ALD. Spatial ALD combines all the unique aspects of Atomic Layer Deposition, like unparalleled film quality, uniformity and step coverage, with high deposition rates and large area and roll-to-roll processing at atmospheric pressure. We will explain how Spatial ALD works and what the benefits are of Spatial ALD over other deposition techniques. We will give several examples of Spatial ALD applications, focusing on large-area and flexible electronics. Join the webinar, discover the potential of Spatial ALD for large area and flexible electronics and find out what Spatial ALD can do for your applications.

Paul Poodt started working at TNO in 2007 after receiving his Ph.D. in physics at the Radboud University Nijmegen, the Netherlands. In 2009, he joined the newly formed Spatial Atomic Layer Deposition team at TNO as lead process scientist and was involved in several spatial ALD process- and equipment development projects, including Spatial ALD for c-Si solar cell passivation and roll-to-roll ALD for encapsulation and barriers. He is one of the co-initiators of TNO’s spin-off company SoLayTec. Since 2013 he is leading the Spatial ALD research program at Holst Centre, developing Spatial ALD technology for large-area and flexible electronics in close collaboration with industry and academia. Paul is also CTO of TNO’s spin-off company SALDtech and part-time associate professor at the Eindhoven University of Technology.

Titel:
Introduction to Spatial Atomic Layer Deposition

Date:
Tuesday, June 2nd

Time:
9am Eindhoven – 3pm Shanghai – 4pm Seoul – 4pm Tokyo
5pm Eindhoven – 11am New York – 8am San Francisco

Duration:
40 minutes and live Q&A

In this webinar you’ll learn about:

• What is Spatial ALD?
• What are the benefits of Spatial ALD over other desposition techniques?
• What methods and applications are possible?